Sputtering

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Sputtering is a physical vapor “PVD” method for depositing thin films onto a surface (substrate). A plasma is created by applying a high voltage to a source material in a magnetic field and thereby accelerating ions towards a substrate where the thin film is deposited. The composition and characteristics of the films can be controlled at a atomic scale. Nano4Energy uses DC, AC as well as HIPIMS power supplies to achieve the optimal conditions for each case.