High power pulsed magnetron sputtering (HiPIMS) is a sputtering mode thatrotatable-plasma-cimg0138 utilizes extremely high power densities in short pulses, giving rise to a high degree of ionization of the sputtered metal and high rate of molecular gas dissociation. Moreover, this substantial increase in the instantageous plasma density is achieved without increasing the thermal load of the target. The pulsed magnetron has been demonstrated to improve adhesion, thickness and homogeneity of the films.


Nano4Energy has developed a series of HIPIMS power supplies in collaboreatio with Ingenieria Viesca. The power supplies are called the HIP-V and can be run as HIPIMS, HIPIMS Bias, DC, Pulsed DC and Bi-polar mode.

www.hipv.eu logo11d_shadow


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