High Power Impulse Magnetron Sputtering (HiPIMS) is a sputtering mode that utilizes extremely high power densities in short pulses, giving rise to a high degree of ionization of the sputtered metal and high rate of molecular gas dissociation. Moreover, this substantial increase in the instantaneous plasma density is achieved without increasing the thermal load of the target. The pulsed magnetron has been demonstrated to improve adhesion, thickness and homogeneity of the films.

Nano4Energy has developed a series of HiPIMS power supplies in collaboration with Ingenieria Viesca. The power supplies are called the hiP-V and can be run as HiPIMS, HiPIMS Bias, DC and Bi-polar mode all possible to get with a fully controllable positive voltage reversal, the HiPlus.

Studies of the role the HiPIMS discharge, as well as an added positive voltage reversal pulse right after the negative HiPIMS pulse, have proven a significant boost on coating properties and productivity in industrial applications.

The instant advantage is that the magnetron surface will be immediately discharged, which will reduce the tendency to arcing. However, there are several other effects observed, such as enhanced high energetic positive ion bombardment towards the substrate. Measurements of the deposition rate, coating hardness and crystallinity have been performed for different metallic coatings (Ti, Al) as well as nitrides (TiN) and oxides (TiO2) deposited in reactive mode and more recently the effects that HiPIMS and positive voltage reversal plays on DLC coatings, in terms of adhesion as well as the functional layer.